CPC G03F 1/60 (2013.01) [G02F 1/0063 (2013.01); G02F 1/13392 (2013.01); G03F 7/039 (2013.01); G03F 7/11 (2013.01); G03F 7/16 (2013.01); G03F 7/2004 (2013.01); G02F 1/13398 (2021.01)] | 6 Claims |
1. A method for producing a substrate consisting of exposing and developing a photosensitive resin composition layer formed on a surface of a substrate base layer to produce a spacer,
wherein the photosensitive resin composition layer formed on the surface of the substrate base layer consists of a photosensitive resin and beads,
wherein the beads consist of acrylic beads, silicone beads, silica beads, talc beads, urethane beads, epoxy beads, zeolite beads or polystyrene beads, having
a shape selected from the group consisting of a spherical shape, a columnar shape, a polygonal shape, and an amorphous shape,
wherein the beads consist of beads having a size in a range of 1 μm to 50 μm, and the size is equal to a height of the spacer,
wherein the method is performed by a roll-to-roll process,
wherein the spacer formed using the photosensitive resin composition layer consists of the photosensitive resin and the beads, and
wherein the exposing is performed in a state where a mask is in contact with the photosensitive resin composition layer.
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