US 11,739,423 B2
Atomic layer deposition apparatus for coating on fine powders
Jing-Cheng Lin, Hsinchu County (TW); Jung-Hua Chang, Hsinchu County (TW); Ta-Hao Kuo, Hsinchu County (TW); and Chia-Cheng Ku, Hsinchu County (TW)
Assigned to SKY TECH INC., Hsinchu County (TW)
Filed by SKY TECH INC., Hsinchu County (TW)
Filed on Mar. 11, 2021, as Appl. No. 17/199,306.
Claims priority of application No. 10913465.6 (TW), filed on Oct. 6, 2020.
Prior Publication US 2022/0106685 A1, Apr. 7, 2022
This patent is subject to a terminal disclaimer.
Int. Cl. C23C 16/455 (2006.01); C23C 16/44 (2006.01); C23C 16/442 (2006.01)
CPC C23C 16/45544 (2013.01) [C23C 16/4412 (2013.01); C23C 16/4417 (2013.01); C23C 16/442 (2013.01)] 10 Claims
OG exemplary drawing
 
1. An atomic layer deposition apparatus for coating particles, comprising:
a vacuum chamber, comprising a reaction space for accommodating a plurality of particles, wherein the reaction space comprises a polygonal columnar shape;
a shaft sealing device, comprising an outer tube and an inner tube, wherein the outer tube comprises an accommodating space for accommodating the inner tube;
a driving unit, connected to the vacuum chamber via the outer tube of the shaft sealing device, wherein when the driving unit drives the vacuum chamber to rotate through the outer tube of the shaft sealing device, the inner tube does not rotate along therewith;
at least one air extraction line, located within the inner tube and fluidly connected to the reaction space of the vacuum chamber, for extracting a gas from the reaction space; and
at least one air intake line, located within the inner tube and fluidly connected to the reaction space of the vacuum chamber, for transporting a precursor or a non-reactive gas to the reaction space, wherein the non-reactive gas blows the particles around in the reaction space.