US 11,739,420 B2
Metal mask, method of manufacturing the same, and method of manufacturing display panel using the metal mask
Hyosung Kim, Hwaseong-si (KR); JinYoung Choi, Suwon-si (KR); Sungmin Hur, Yongin-si (KR); Hyunsang Seo, Daejeon (KR); Hyun-Ju Lee, Asan-si (KR); Manjae Park, Cheonan-si (KR); Nari Ahn, Seongnam-si (KR); Hyeongsuk Yoo, Asan-si (KR); and Dongwon Han, Seoul (KR)
Assigned to SAMSUNG DISPLAY CO., LTD., Gyeonggi-Do (KR)
Filed by Samsung Display Co., LTD., Yongin-si (KR)
Filed on Jun. 4, 2020, as Appl. No. 16/892,415.
Claims priority of application No. 10-2019-0113594 (KR), filed on Sep. 16, 2019.
Prior Publication US 2021/0079518 A1, Mar. 18, 2021
Int. Cl. C23C 16/04 (2006.01); H01L 27/32 (2006.01); C22C 38/08 (2006.01); H10K 50/844 (2023.01); H10K 59/12 (2023.01); H10K 71/00 (2023.01); H10K 71/10 (2023.01)
CPC C23C 16/042 (2013.01) [C22C 38/08 (2013.01); H10K 50/844 (2023.02); H10K 59/12 (2023.02); H10K 71/00 (2023.02); H10K 71/10 (2023.02); H10K 59/1201 (2023.02)] 7 Claims
OG exemplary drawing
 
1. A deposition mask comprising:
a metal mask body in which a deposition opening is defined; and
a coating layer comprising an aluminum oxynitride layer, on an outer surface of the metal mask body,
wherein the aluminum oxynitride layer forms an outer surface of the deposition mask,
wherein the metal mask body comprises:
the outer surface comprising an upper surface and a lower surface which is opposite to the upper surface, and
an inner wall extending between the upper surface and the lower surface, the inner wall defining the deposition opening,
wherein the aluminum oxynitride layer which forms the outer surface of the deposition mask comprises:
an upper coating layer covering the upper surface of the metal mask body,
a lower coating layer covering the lower surface of the metal mask body, and
an inner coating layer covering the inner wall of the metal mask body,
wherein the aluminum oxynitride of each of the upper coating layer, the lower coating layer and the inner coating layer is represented by AlNx·(Al2O3)1-x (x=0.1-0.9), and
wherein the aluminum oxynitride of each of the upper coating layer, the lower coating layer and the inner coating layer comprises aluminum oxide and aluminum nitride which are covalently bonded with each other.