US 11,739,267 B2
LC medium
Yeon-Jeong Han, Gyeonggi-do (KR); Dong-Hyun Kim, Seoul (KR); Heui-Seok Jin, Gyeonggi-do (KR); and Chang-Suk Choi, Chungcheongnam-do (KR)
Assigned to MERCK PATENT GMBH, Darmstadt (DE)
Filed by MERCK PATENT GMBH, Darmstadt (DE)
Filed on Jun. 26, 2020, as Appl. No. 16/913,971.
Claims priority of application No. 19183112 (EP), filed on Jun. 28, 2019.
Prior Publication US 2020/0407640 A1, Dec. 31, 2020
Int. Cl. G02F 1/1333 (2006.01); C09K 19/34 (2006.01); C09K 19/02 (2006.01); G02F 1/137 (2006.01); C09K 19/04 (2006.01)
CPC C09K 19/3402 (2013.01) [C09K 19/0208 (2013.01); C09K 2019/0466 (2013.01); C09K 2019/3422 (2013.01); G02F 1/137 (2013.01); G02F 1/13706 (2021.01)] 26 Claims
 
1. An LC medium with positive dielectric anisotropy, wherein said LC medium has a clearing point ≥105° C. and a birefringence from 0.10 to 0.13, and comprises
at least one compound of formula I in a total concentration of said at least one compound of formula I of >0 and ≤10%

OG Complex Work Unit Chemistry
in which
R1 and R2 independently of each other denote alkyl having 1 to 6 C atoms,
and
at least one compound of formula XII

OG Complex Work Unit Chemistry
in which
X0 is F, Cl, CN, SF5, SCN, NCS, a halogenated alkyl radical, a halogenated alkenyl radical, a halogenated alkoxy radical or a halogenated alkenyloxy radical having up to 6 C atoms,
“alkenyl” denote C2-6-alkenyl, and
L denotes H or F.
 
2. An LC medium with positive dielectric anisotropy, comprising
at least one compound of formula I in a total concentration of said at least one compound of formula I of >0 and ≤10%

OG Complex Work Unit Chemistry
in which
R1 and R2 independently of each other denote alkyl having 1 to 6 C atoms,
and
at least one compound of formula XII

OG Complex Work Unit Chemistry
in which
X0 is F, Cl, CN, SF5, SCN, NCS, a halogenated alkyl radical, a halogenated alkenyl radical, a halogenated alkoxy radical or a halogenated alkenyloxy radical having up to 6 C atoms,
“alkenyl” denote C2-6-alkenyl, and
L denotes H or F
and
at least one compound of the following formulae III6, III9, III20 and/or III21

OG Complex Work Unit Chemistry
in which
R0 is an unsubstituted or halogenated alkyl or alkoxy radical having 1 to 15 C atoms, in which one or more CH2 groups are each optionally replaced, independently of one another, by —C≡C—, —CF2O—, —CH═CH—,

OG Complex Work Unit Chemistry
—O—, —CO—O— or —O—CO— in such a way that O atoms are not linked directly to one another, or denotes

OG Complex Work Unit Chemistry
X0 is F, Cl, CN, SF5, SCN, NCS, a halogenated alkyl radical, a halogenated alkenyl radical, a halogenated alkoxy radical or a halogenated alkenyloxy radical having up to 6 C atoms, and
Y2 is H or F.