CPC B08B 7/04 (2013.01) [B08B 17/02 (2013.01); H01J 37/02 (2013.01); H01J 37/1472 (2013.01); H01J 37/18 (2013.01); H01J 37/3177 (2013.01); H01J 2237/006 (2013.01); H01J 2237/022 (2013.01); H01J 2237/0435 (2013.01); H01J 2237/0453 (2013.01); H01J 2237/0492 (2013.01)] | 20 Claims |
1. A method for preventing or removing contamination of a charged particle transmitting aperture in a charged particle beam system comprising a charged particle optical column arranged in a vacuum chamber, a cleaning agent source, and a conduit connected to the cleaning agent source, the charged particle optical column being configured to project a beam of charged particles onto a target and comprising:
a charged particle optical element configured to influence the beam of charged particles and comprising:
the charged particle transmitting aperture configured to transmit and/or influence the beam of charged particles, and
a vent hole configured to provide a flow path between a first side and a second side of the charged particle optical element,
the method comprising:
introducing the cleaning agent from the cleaning agent source towards the charged particle optical element via the conduit extending into and within the vacuum chamber to guide the cleaning agent towards the charged particle optical element; and
directing the beam of charged particles towards the charged particle optical element while introducing the cleaning agent towards the charged particle optical element, at least part of species of the cleaning agent flowing at least through the charged particle optical element via the vent hole.
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