| CPC B01D 53/0454 (2013.01) [B01D 53/0438 (2013.01); B01D 2253/102 (2013.01); B01D 2253/112 (2013.01); B01D 2257/204 (2013.01); B01D 2258/0216 (2013.01); H01L 21/67017 (2013.01)] | 20 Claims |
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1. An exhaust gas processing system, comprising:
a process chamber in which a process for a semiconductor is performable and in which an exhaust gas is producible;
an exhaust gas measurer connected to the process chamber, the exhaust gas measurer being configured to receive the exhaust gas from the process chamber and to measure a concentration of the exhaust gas;
a solid producing gas processor connected to the exhaust gas measurer, the solid producing gas processor being configured to receive the exhaust gas from the exhaust gas measurer and to remove a solid producing gas contained in the exhaust gas;
a gas supply connected to the solid producing gas processor, the gas supply being configured to supply a dilution gas and a cooling gas to the solid producing gas processor;
a processed gas measurer connected to the solid producing gas processor, the processed gas measurer being configured to receive, as a processed gas, an exhaust gas free of the solid producing gas from the solid producing gas processor and to measure a temperature of the processed gas and ingredients of the processed gas; and
a controller connected to the exhaust gas measurer, the processed gas measurer, the solid producing gas processor, and the gas supply, the controller being configured to receive measurement results of the concentration of the exhaust gas from the exhaust gas measurer and measurement results of the temperature of the processed gas and the ingredients of the processed gas from the processed gas measurer and to control the gas supply based on the measurement results.
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