US 12,069,934 B2
Display device and method of manufacturing the same
Woosuk Jung, Yongin-si (KR); Jaeheung Ha, Suwon-si (KR); Wonjong Kim, Suwon-si (KR); Jongwoo Kim, Hwaseong-si (KR); Heeyeon Park, Seoul (KR); Changyeong Song, Suwon-si (KR); Hyein Yang, Siheung-si (KR); and Yongchan Ju, Yongin-si (KR)
Assigned to SAMSUNG DISPLAY CO., LTD., Gyeonggi-Do (KR)
Filed by Samsung Display Co., Ltd., Yongin-Si (KR)
Filed on Oct. 7, 2021, as Appl. No. 17/496,139.
Claims priority of application No. 10-2021-0011433 (KR), filed on Jan. 27, 2021.
Prior Publication US 2022/0238851 A1, Jul. 28, 2022
Int. Cl. H10K 71/00 (2023.01); H10K 50/844 (2023.01); H10K 50/858 (2023.01); H10K 102/00 (2023.01)
CPC H10K 71/00 (2023.02) [H10K 50/844 (2023.02); H10K 50/858 (2023.02); H10K 2102/00 (2023.02); H10K 2102/351 (2023.02)] 20 Claims
OG exemplary drawing
 
1. A method of manufacturing a display device, the method comprising:
forming a light emitting structure on a substrate; and
forming a thin film encapsulation layer on the light emitting structure by chemical vapor deposition equipment, the forming the thin film encapsulation layer including:
forming a first inorganic layer; and
forming a first-1 inorganic layer and a first-2 inorganic layer disposed on the first-1 inorganic layer by performing a first plasma treatment on a first portion of the first inorganic layer which is opposite to a second portion of the first inorganic layer facing the light emitting structure, and
wherein a first raw material in the forming the first inorganic layer includes hydrogen (H2), and a second raw material in the performing the first plasma treatment exclusively consists of hydrogen, and
the first-2 inorganic layer includes a material identical to a material of the first-1 inorganic layer and has dangling bonds less than dangling bonds of the first-1 inorganic layer.