CPC H10K 71/00 (2023.02) [H10K 50/844 (2023.02); H10K 50/858 (2023.02); H10K 2102/00 (2023.02); H10K 2102/351 (2023.02)] | 20 Claims |
1. A method of manufacturing a display device, the method comprising:
forming a light emitting structure on a substrate; and
forming a thin film encapsulation layer on the light emitting structure by chemical vapor deposition equipment, the forming the thin film encapsulation layer including:
forming a first inorganic layer; and
forming a first-1 inorganic layer and a first-2 inorganic layer disposed on the first-1 inorganic layer by performing a first plasma treatment on a first portion of the first inorganic layer which is opposite to a second portion of the first inorganic layer facing the light emitting structure, and
wherein a first raw material in the forming the first inorganic layer includes hydrogen (H2), and a second raw material in the performing the first plasma treatment exclusively consists of hydrogen, and
the first-2 inorganic layer includes a material identical to a material of the first-1 inorganic layer and has dangling bonds less than dangling bonds of the first-1 inorganic layer.
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