CPC H05K 3/022 (2013.01) [C23C 28/322 (2013.01); H05K 3/422 (2013.01); H05K 3/426 (2013.01); H05K 3/427 (2013.01); H05K 2203/0716 (2013.01); H05K 2203/072 (2013.01); H05K 2203/0723 (2013.01); Y10T 428/12611 (2015.01)] | 9 Claims |
1. A method for manufacturing a laminated film structure comprising:
forming an oxide layer on a to-be-treated surface of a to-be-treated object by bringing the to-be-treated surface into contact with a reaction solution containing fluorine and an oxide precursor, the to-be-treated object being made of an insulator or an insulator having a conductive layer formed on the surface thereof in advance;
removing fluorine in the oxide layer;
forming a catalyst layer by bringing the oxide layer into contact with a catalyst liquid; and
forming a metal film on the catalyst layer by an electroless plating method.
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