US 12,068,154 B2
Method of forming a nitrogen-containing carbon film and system for performing the method
Hirotsugu Sugiura, Tama (JP); and Yoshiyuki Kikuchi, Tokyo (JP)
Assigned to ASM IP Holding B.V., Almere (NL)
Filed by ASM IP Holding B.V., Almere (NL)
Filed on Apr. 8, 2021, as Appl. No. 17/225,386.
Claims priority of provisional application 63/009,318, filed on Apr. 13, 2020.
Prior Publication US 2021/0320003 A1, Oct. 14, 2021
Int. Cl. C23C 16/34 (2006.01); C23C 16/455 (2006.01); C23C 16/50 (2006.01); H01J 37/32 (2006.01); H01L 21/02 (2006.01)
CPC H01L 21/02118 (2013.01) [C23C 16/347 (2013.01); C23C 16/45553 (2013.01); C23C 16/50 (2013.01); H01J 37/3244 (2013.01); H01L 21/02205 (2013.01); H01L 21/02274 (2013.01); H01L 21/0228 (2013.01); H01J 2237/332 (2013.01)] 13 Claims
OG exemplary drawing
 
1. A method of forming a nitrogen-containing carbon film, the method comprising the steps of:
providing a precursor to a reaction chamber, wherein a chemical formula of the precursor comprises
a cyclic compound having a cyclic structure comprising C, H, and N; and
forming the nitrogen-containing film on a surface of a substrate using the precursor,
wherein the precursor comprises a carbon-terminated carbon-nitrogen bond and wherein the precursor is selected from one or more of the group consisting of 1,3,5-trimethylhexahydro-1,3,5-triazine, 2,4,6-trimethyl-s-triazene, and 1-methyl-2-pyrrolidinone.