CPC G03F 7/70483 (2013.01) [G03F 7/70033 (2013.01); G03F 7/7085 (2013.01)] | 20 Claims |
15. A semiconductor manufacturing system, comprising:
a main controller;
an analyzer module coupled to the main controller;
an extreme ultraviolet (EUV) radiation source that comprises:
a chamber having a cone shape;
a first opening of the chamber configured for connecting a droplet generator that is configured to introduce tin droplets into the chamber;
a second opening of the chamber configured for connecting a droplet catcher that is configured to collect tin debris;
an excitation laser for generating a light beam that is configured to focus onto the tin droplets to generate EUV radiation;
a collecting mirror configured for directing the EUV radiation toward a third opening;
a blocking shield between the third opening and the collecting mirror and configured to block the light beam from exiting the chamber through the third opening; and
an observation system that comprises:
a flat elongated surface;
a lead screw mounted on the flat elongated surface;
a first motor mechanically coupled to the lead screw and configured to rotate the lead screw;
a view controller coupled to the first motor and configured for controlling rotation of the lead screw;
an extendible section mounted from a first side of the extendible section on the lead screw;
a camera assembly mounted on a first end of a fiber optics cable, wherein the camera assembly is mounted on a second side, opposite to the first side, of the extendible section; and
an image processing system coupled through a second end, opposite the first end, to the fiber optics cable, wherein:
the main controller is configured to command the view controller to move the camera assembly inside the chamber beyond the blocking shield, and
the main controller is configured to command the image processing system to acquire one or more images from a region beyond the blocking shield.
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