US 12,066,418 B2
Method for measuring concentration of fluorine gas contained in halogen fluoride-containing gas by ultra violet spectroscopy
Atsushi Suzuki, Tokyo (JP)
Assigned to Resonac Corporation, Tokyo (JP)
Appl. No. 17/609,211
Filed by SHOWA DENKO K.K., Tokyo (JP)
PCT Filed Nov. 12, 2020, PCT No. PCT/JP2020/042275
§ 371(c)(1), (2) Date Nov. 5, 2021,
PCT Pub. No. WO2021/106602, PCT Pub. Date Jun. 3, 2021.
Claims priority of application No. 2019-214261 (JP), filed on Nov. 27, 2019.
Prior Publication US 2022/0214323 A1, Jul. 7, 2022
Int. Cl. G01N 33/00 (2006.01); G01N 21/01 (2006.01); G01N 21/25 (2006.01); G01N 21/31 (2006.01); G01N 21/33 (2006.01)
CPC G01N 33/0052 (2013.01) [G01N 21/01 (2013.01); G01N 21/255 (2013.01); G01N 21/314 (2013.01); G01N 21/33 (2013.01); G01N 2021/0112 (2013.01)] 8 Claims
OG exemplary drawing
 
1. A method for measuring a concentration of fluorine gas, the method comprising:
irradiating a halogen fluoride-containing gas with ultraviolet light in which a ratio (WX/WF) of a maximum value (WX) of ultraviolet light intensity in a wavelength region of less than 250 nm with respect to an ultraviolet light intensity (WF) at a wavelength of 285 nm is 1/10 or less; and
measuring an absorbance at a wavelength of 285 nm to obtain a concentration of fluorine gas contained in the halogen fluoride-containing gas.