US 12,066,378 B2
Device and method for analyzing a material
Alexander Bauer, Oberursel (DE); Otto Hertzberg, Frankfurt am Main (DE); and Thorsten Lubinski, Berlin (DE)
Assigned to DiaMon Tech AG, Berlin (DE)
Filed by DiaMonTech AG, Berlin (DE)
Filed on Mar. 18, 2022, as Appl. No. 17/698,291.
Application 17/698,291 is a continuation of application No. 15/776,544, granted, now 11,280,728, previously published as PCT/EP2016/080046, filed on Dec. 7, 2016.
Claims priority of application No. PCT/DE2015/200532 (WO), filed on Dec. 9, 2015; application No. 102016214262.3 (DE), filed on Aug. 2, 2016; and application No. 102016215580.6 (DE), filed on Aug. 19, 2016.
Prior Publication US 2022/0205909 A1, Jun. 30, 2022
This patent is subject to a terminal disclaimer.
Int. Cl. G01N 21/33 (2006.01); A61B 5/00 (2006.01); A61B 5/145 (2006.01); A61B 5/1455 (2006.01); G01N 21/17 (2006.01); G01N 21/3563 (2014.01); G01N 21/55 (2014.01); G01N 21/552 (2014.01); G01N 21/63 (2006.01); G01N 33/483 (2006.01); G01N 33/49 (2006.01); G01N 33/66 (2006.01)
CPC G01N 21/3563 (2013.01) [A61B 5/14532 (2013.01); A61B 5/1455 (2013.01); A61B 5/6826 (2013.01); A61B 5/6843 (2013.01); A61B 5/7228 (2013.01); G01N 21/171 (2013.01); G01N 21/1717 (2013.01); G01N 21/55 (2013.01); G01N 21/552 (2013.01); G01N 21/636 (2013.01); G01N 33/4833 (2013.01); G01N 33/49 (2013.01); G01N 33/66 (2013.01); A61B 5/70 (2013.01); A61B 2560/0223 (2013.01); A61B 2562/0233 (2013.01); G01N 2021/1712 (2013.01); G01N 2021/1721 (2013.01); G01N 2021/1725 (2013.01); G01N 21/33 (2013.01)] 38 Claims
OG exemplary drawing
 
1. A method for analyzing a material, the method comprising:
an optical medium is brought into direct contact with a first region of a surface of the material,
with an excitation transmission device, at least one excitation light beam with at least one excitation wavelength is generated by an at least partially simultaneous or consecutive operation of a plurality of laser emitters of a laser light source, and the at least one excitation light beam is radiated into a material volume, which is located underneath said first region of the surface of the material,
with a device for emitting a measuring beam, a measuring beam is emitted which penetrates the optical medium,
with a detection device a response signal is detected, wherein detecting said response signal (SR) comprises detecting said measuring beam as a time-dependent response signal, after this measuring beam has been reflected at least once at an interface of the optical medium, which is in contact with the first region of the surface of the material, and
the material is analyzed on the basis of the detected response signal (SR), wherein to control the excitation transmission device for generating the excitation light beam, a series of stored equidistant or non-equidistant settings can be adjusted successively, each of which determines an excitation wavelength of the laser source and among which at least 3 wavelengths of absorption maxima of a substance to be identified in the material are included.