CPC C23C 16/4412 (2013.01) [C23C 16/4402 (2013.01); C23C 16/45536 (2013.01); H01J 37/32357 (2013.01); H01J 37/32834 (2013.01)] | 17 Claims |
1. A vapor deposition apparatus comprising:
a plurality of first injection units injecting a first raw gas in a first direction, at least one of the plurality of first injection unit defining a first recess which is partially defined in the vapor deposition apparatus;
an exhaust unit located adjacent to at least one of the plurality of first injection units and discharging an exhaust gas, the exhaust unit defining a second recess which is partially defined in the vapor deposition apparatus;
a first filter unit mounted on an end portion of a side wall of the first recess of the at least one of the plurality of first injection unit; and
a second filter unit which is mounted on an end portion of a side wall of the second recess of the exhaust unit and has a structure which is reverse to a structure of the first filter unit in the first direction,
wherein the first filter unit and the second filter unit each comprises a plurality of plates separated from one another in the first direction and disposed in parallel to one another,
wherein each of the plurality of plates has holes formed therein,
wherein, in each of the plurality of plates of the second filter unit, sizes of horizontal cross-sections of the holes gradually increase from a bottom surface of a plate of the plurality of plates to a top surface of the plate of the plurality of plates in a direction in which the exhaust gas moves, and
wherein a lowest plate of the plurality of plates of the second filter unit is aligned with a lowest plate of the plurality of plates of the first filter unit.
|