CPC C23C 14/0036 (2013.01) [B01D 53/30 (2013.01); C23C 14/0641 (2013.01); C23C 14/08 (2013.01); C23C 14/50 (2013.01); C23C 14/52 (2013.01); C23C 14/54 (2013.01); C23C 14/566 (2013.01)] | 21 Claims |
1. A film forming apparatus comprising:
a process chamber forming a film on a substrate;
an abatement device detoxifying a first exhaust gas exhausted from the process chamber;
a first supply pipe supplying a gas containing water to the process chamber;
a first vacuum pump provided in a first flow path of the first exhaust gas between the process chamber and the abatement device;
a second vacuum pump provided in the first flow path between the first vacuum pump and the abatement device; and
a first detector provided in the first flow path between the second vacuum pump and the abatement device, the first detector detecting a hydrogenated gas,
wherein the first detector includes a first gas detector detecting a first hydrogenated gas and a second gas detector detecting a second hydrogenated gas different from the first hydrogenated gas.
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