US 12,065,725 B2
Film forming apparatus and film forming method
Yuta Konno, Kuwana (JP); Toshihiko Nagase, Saitama (JP); Atsuko Sakata, Yokkaichi (JP); Kohei Nagata, Yokkaichi (JP); Ryohei Kitao, Yokkaichi (JP); Akifumi Gawase, Kuwana (JP); and Takeshi Iwasaki, Kuwana (JP)
Assigned to Kioxia Corporation, Minato-ku (JP)
Filed by Kioxia Corporation, Minato-ku (JP)
Filed on Aug. 26, 2020, as Appl. No. 17/002,822.
Claims priority of application No. 2019-171007 (JP), filed on Sep. 20, 2019; and application No. 2020-118373 (JP), filed on Jul. 9, 2020.
Prior Publication US 2021/0087669 A1, Mar. 25, 2021
Int. Cl. C23C 14/00 (2006.01); B01D 53/30 (2006.01); C23C 14/06 (2006.01); C23C 14/08 (2006.01); C23C 14/50 (2006.01); C23C 14/52 (2006.01); C23C 14/54 (2006.01); C23C 14/56 (2006.01)
CPC C23C 14/0036 (2013.01) [B01D 53/30 (2013.01); C23C 14/0641 (2013.01); C23C 14/08 (2013.01); C23C 14/50 (2013.01); C23C 14/52 (2013.01); C23C 14/54 (2013.01); C23C 14/566 (2013.01)] 21 Claims
OG exemplary drawing
 
1. A film forming apparatus comprising:
a process chamber forming a film on a substrate;
an abatement device detoxifying a first exhaust gas exhausted from the process chamber;
a first supply pipe supplying a gas containing water to the process chamber;
a first vacuum pump provided in a first flow path of the first exhaust gas between the process chamber and the abatement device;
a second vacuum pump provided in the first flow path between the first vacuum pump and the abatement device; and
a first detector provided in the first flow path between the second vacuum pump and the abatement device, the first detector detecting a hydrogenated gas,
wherein the first detector includes a first gas detector detecting a first hydrogenated gas and a second gas detector detecting a second hydrogenated gas different from the first hydrogenated gas.