CPC H01M 4/60 (2013.01) [H01M 4/366 (2013.01); H01M 4/505 (2013.01); H01M 4/623 (2013.01); H01M 10/0525 (2013.01); H01M 10/0565 (2013.01); H01M 2004/021 (2013.01); H01M 2300/0082 (2013.01); H01M 2300/0085 (2013.01)] | 19 Claims |
1. A solid ion conductive layer, comprising:
a first phase extending continuously for at least a portion of the solid ion conductive layer, wherein the first phase comprises an ion conductive material comprising a halide-based material represented by formula M3−δ(Mek+)fX3−δ+*f, wherein −3≤δ<3, 0<f≤1, k is the valence of Me, 2≤k<6, M includes an alkali metal element including Li, Me includes a metal element that is different from M, and X includes a halogen; and
a second phase comprising an organic material comprising a binder material,
wherein the binder material comprises an HLB value of 0; and a Reactivity Value of 0; and
wherein the binder material comprises poly(vinylidene fluoride), polyisobutylene, or a combination thereof.
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16. A composition, comprising a solid ion conductive material including a halide-based material represented by M3−δ(Mek+)fX3−δk*f, wherein −3≤δ<3, 0<f≤1, k is the valence of Me, 2≤k<6, M includes an alkali metal element including Li, Me includes a metal element that is different from M, and X includes a halogen and an organic material, wherein the organic material comprises polyisobutylene and a solvent having an HLB value of 0 and a Reactivity Value of 0.
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