US 11,735,459 B2
Electrostatic chuck
Mina Cho, Anseong-si (KR); and Jung Hyun Park, Anseong-si (KR)
Assigned to MICO CERAMICS LTD., Anseong-si (KR)
Filed by MICO CERAMICS LTD., Anseong-si (KR)
Filed on Sep. 7, 2022, as Appl. No. 17/930,361.
Claims priority of application No. 10-2021-0174516 (KR), filed on Dec. 8, 2021.
Prior Publication US 2023/0178408 A1, Jun. 8, 2023
Int. Cl. H01T 23/00 (2006.01); H01L 21/683 (2006.01); H01L 21/67 (2006.01); H01J 37/32 (2006.01)
CPC H01L 21/6833 (2013.01) [H01J 37/32697 (2013.01); H01L 21/67063 (2013.01)] 7 Claims
OG exemplary drawing
 
1. An electrostatic chuck comprising:
a base substrate;
an electrostatic chuck plate fixed on the base substrate, the electrostatic chuck plate having an electrode therein; and
an electrode part disposed in a hole in the base substrate to supply power to the electrode,
wherein the electrode part comprises:
a housing inserted into the hole in the base substrate;
an electrode rod passing through the inner wall of the housing such that one end thereof is in contact with the electrode; and
an elastic support body configured to support the electrode rod at multiple points on the inner wall of the housing,
wherein the elastic support body applies an elastic force to the electrode rod toward the center at multiple points along the circumference of the inner wall of the housing.