US 11,735,394 B2
Charged particle beam apparatus
Takafumi Miwa, Tokyo (JP); Seiichiro Kanno, Tokyo (JP); and Go Miya, Tokyo (JP)
Assigned to HITACHI HIGH-TECH CORPORATION, Tokyo (JP)
Appl. No. 17/295,978
Filed by Hitachi High-Tech Corporation, Tokyo (JP)
PCT Filed Nov. 30, 2018, PCT No. PCT/JP2018/044109
§ 371(c)(1), (2) Date May 21, 2021,
PCT Pub. No. WO2020/110276, PCT Pub. Date Jun. 4, 2020.
Prior Publication US 2022/0028650 A1, Jan. 27, 2022
Int. Cl. H01J 37/244 (2006.01); H01J 37/20 (2006.01); H01J 37/22 (2006.01); H01J 37/26 (2006.01)
CPC H01J 37/244 (2013.01) [H01J 37/20 (2013.01); H01J 37/22 (2013.01); H01J 37/26 (2013.01)] 11 Claims
OG exemplary drawing
 
1. A charged particle beam apparatus comprising:
a sample stage comprising an electrostatic chuck configured to hold a measurement sample and a holding base disposed apart from the electrostatic chuck;
a charged particle beam source configured to irradiate the measurement sample with a charged particle beam;
a detector configured to detect a charged particle emitted by irradiation with the charged particle beam;
a foreign matter observation sample bonded to the holding base and disposed on the sample stage adjacent to the measurement sample; and
an optical microscope configured to observe a foreign matter on the foreign matter observation sample.