CPC G03F 7/2043 (2013.01) [G03F 7/705 (2013.01); G03F 7/70616 (2013.01); G03F 7/70625 (2013.01); G03F 7/70633 (2013.01); H01L 22/12 (2013.01); H01L 22/20 (2013.01)] | 20 Claims |
1. A method, comprising:
estimating, by a hardware computer system, a characteristic that will be imparted to a substrate to be processed by one or more process apparatuses by combining one or more values of one or more contributions to the characteristic by the one or more process apparatuses with one or more values of the characteristic, at least one of the one or more contributions to the characteristic being of a deposition tool configured to perform atomic layer deposition, chemical vapor deposition and/or a physical vapor deposition and being a contribution separate from a contribution to the characteristic by one or more other process apparatuses.
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