US 11,732,358 B2
High temperature chemical vapor deposition lid
Muhannad Mustafa, Milpitas, CA (US); Muhammad M. Rasheed, San Jose, CA (US); Mario D. Sanchez, San Jose, CA (US); Srinivas Gandikota, Santa Clara, CA (US); and Wei V. Tang, Santa Clara, CA (US)
Assigned to APPLIED MATERIALS, INC., Santa Clara, CA (US)
Filed by Applied Materials, Inc., Santa Clara, CA (US)
Filed on Aug. 17, 2022, as Appl. No. 17/889,930.
Application 17/889,930 is a division of application No. 17/350,073, filed on Jun. 17, 2021, granted, now 11,447,866.
Claims priority of provisional application 63/040,492, filed on Jun. 17, 2020.
Prior Publication US 2022/0389585 A1, Dec. 8, 2022
Int. Cl. C23C 16/40 (2006.01); C23C 16/455 (2006.01); C23C 16/52 (2006.01); C23C 16/50 (2006.01)
CPC C23C 16/45565 (2013.01) [C23C 16/455 (2013.01); C23C 16/45536 (2013.01); C23C 16/50 (2013.01); C23C 16/52 (2013.01)] 15 Claims
OG exemplary drawing
 
1. A processing method comprising: flowing a first gas through a first inlet line into a gas funnel; flowing a second gas through a second inlet line connected to the first inlet line upstream of the gas funnel, the second gas flowing through a valve configured to allow a flow of gas downstream only; igniting a plasma of the second gas; exhausting gases through a pump liner; wherein the pump liner comprises a body having an inner wall, an outer wall, a top wall and a bottom wall, the body having a lower portion and an upper portion, the inner wall extending around a central axis spaced a first distance from the central axis forming an open central region; and powering a liner heater to control a temperature in the pump liner, wherein the liner heater comprises a plurality of separate segments spaced around the top wall of the pump liner wherein each of the segments is independently controlled.