US 11,732,349 B2
In-line coater for vacuum deposition of thin film coatings
Vladimir J. Shiripov, Minsk (BY); Yaughen A. Khakhlou, Minsk (BY); and Sergei P. Maryshev, Minsk (BY)
Assigned to OOO IZOVAK TEHNOLOGII, Minsk (BY)
Filed by OOO IZOVAK Tehnologii, Minsk (BY)
Filed on May 1, 2019, as Appl. No. 16/400,241.
Claims priority of application No. 201800373 (EA), filed on May 4, 2018.
Prior Publication US 2019/0338413 A1, Nov. 7, 2019
Int. Cl. C23C 14/56 (2006.01); C23C 14/50 (2006.01); H01L 21/677 (2006.01); H01L 21/687 (2006.01); C23C 16/54 (2006.01); C23C 16/458 (2006.01); H01L 21/67 (2006.01)
CPC C23C 14/566 (2013.01) [C23C 14/505 (2013.01); C23C 14/568 (2013.01); C23C 16/4583 (2013.01); C23C 16/4584 (2013.01); C23C 16/4587 (2013.01); C23C 16/4588 (2013.01); C23C 16/54 (2013.01); H01L 21/67173 (2013.01); H01L 21/67706 (2013.01); H01L 21/67709 (2013.01); H01L 21/67712 (2013.01); H01L 21/68764 (2013.01); H01L 21/68771 (2013.01)] 14 Claims
OG exemplary drawing
 
1. An in-line coater for vacuum deposition of thin film coatings comprising:
an input load lock chamber and an output load lock chamber disposed at opposite ends of the in-line coater;
at least one process chamber comprising processing devices for treating a substrate surface and for depositing thin films on the substrate surface, monitoring devices;
a pass-through transport system along a length of the in-line coater, with a carriage made as a supporting frame for successively moving a rotatable substrate holder from the input load lock chamber to the output load lock chamber, the rotatable substrate holder having a forming surface with substrates mounted on the forming surface; vacuum gates; and
a rotary-motion feedthrough of the substrate holder disposed in the process chamber and comprising a coupling device for coupling the feedthrough with a central shaft of the substrate holder, the coupling device being mounted on a rotation axis of the substrate holder and cantilevered on the supporting frame;
wherein the at least one process chamber comprises a recession of a size determined by dimensions of the rotatable substrate holder, the recession being sufficient for housing the processing devices and monitoring devices;
wherein the substrate holder has an open face and a closed face, the open face being oriented towards a working area and having a circumscribed diameter corresponding to a maximal circumscribed diameter of the substrate holder, and wherein the transport system of the in-line coater is adapted to moving the substrate holder synchronously step-by-step from the input load lock chamber to the output load lock chamber in a direction perpendicular to the rotation axis of the substrate holder, and wherein the transport system is adapted to moving the substrate holder to the working area along the rotation axis of the substrate holder in each of the least one process chamber.