US 11,732,190 B2
Chemical solution, method for manufacturing chemical solution, and method for treating substrate
Nobuaki Sugimura, Shizuoka (JP); Tomonori Takahashi, Shizuoka (JP); Hiroyuki Seki, Shizuoka (JP); and Atsushi Mizutani, Shizuoka (JP)
Assigned to FUJIFILM Corporation, Tokyo (JP)
Filed by FUJIFILM Corporation, Tokyo (JP)
Filed on Jul. 28, 2020, as Appl. No. 16/940,515.
Application 16/940,515 is a continuation of application No. PCT/JP2019/001452, filed on Jan. 18, 2019.
Claims priority of application No. 2018-018459 (JP), filed on Feb. 5, 2018; and application No. 2018-160719 (JP), filed on Aug. 29, 2018.
Prior Publication US 2020/0354632 A1, Nov. 12, 2020
Int. Cl. C09K 13/04 (2006.01); H01L 21/02 (2006.01); H01L 21/3213 (2006.01)
CPC C09K 13/04 (2013.01) [H01L 21/02071 (2013.01); H01L 21/32134 (2013.01)] 46 Claims
OG exemplary drawing
 
1. A chemical solution comprising:
one or more kinds of periodic acids selected from the group consisting of a periodic acid and a salt thereof;
a first metal component which is Zr; and
water,
wherein a content of the first metal component is 1 ppt by mass to 100 ppm by mass with respect to a total mass of the periodic acids in the chemical solution.