CPC B24B 53/017 (2013.01) [B08B 1/04 (2013.01); B08B 3/02 (2013.01); H01L 21/67046 (2013.01); H01L 21/67051 (2013.01); B08B 2203/0288 (2013.01)] | 6 Claims |
1. A method of cleaning a support surface of a buff table of an apparatus for buff-processing a processing target object, the buff table being for supporting the processing target object,
the apparatus comprising: a nozzle for supplying the support surface with a chemical solution for cleaning the support surface of the buff table; and
a buff head to which a buff pad for buff-processing the processing target object through physical contact is attached, wherein the buff head is configured such that a cleaning member including a brush or a sponge member for cleaning the support surface of the buff table through physical contact is attached to the buff head;
wherein the buff table includes a fluid passage that extends to the support surface and is for supplying a fluid to the support surface through the buff table while the support surface of the buff table is cleaned,
wherein the fluid passage is configured to communicate with a pure water and/or chemical solution supply source, and
wherein the fluid passage is configured to be communicable with a vacuum source for causing the processing target object to be vacuum-sucked onto the support surface while the processing target object is buff-processed,
the method comprising: a step of supplying the support surface with a chemical solution from the nozzle for cleaning the support surface of the buff table; and
a step of cleaning the support surface of the buff table through physical contact using the brush or the sponge member.
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