| US D1,088,409 S | ||
| Mask | ||
| Xiangwei Zeng, Qianjiang (CN) | ||
| Filed by Xiangwei Zeng, Qianjiang (CN) | ||
| Filed on Nov. 7, 2022, as Appl. No. 29/859,110. | ||
| Term of patent 15 Years | ||
| LOC (15) Cl. 02 - 02 | ||
| U.S. Cl. D 2—870 |
|
The ornamental design for a mask, as shown and described.
|