US 12,394,609 B2
Product removal apparatus, treatment system, and product removal method
Fumiya Okazaki, Tokyo (JP)
Assigned to EBARA CORPORATION, Tokyo (JP)
Filed by EBARA CORPORATION, Tokyo (JP)
Filed on Sep. 27, 2022, as Appl. No. 17/935,595.
Claims priority of application No. 2021-169407 (JP), filed on Oct. 15, 2021.
Prior Publication US 2023/0119979 A1, Apr. 20, 2023
Int. Cl. H01J 37/32 (2006.01); G01B 21/08 (2006.01); G01K 13/00 (2021.01)
CPC H01J 37/32862 (2013.01) [G01B 21/08 (2013.01); G01K 13/00 (2013.01); H01J 37/32449 (2013.01); H01J 2237/335 (2013.01)] 13 Claims
OG exemplary drawing
 
1. A product removal apparatus comprising:
a vacuum pump;
a sensor for measuring the temperature of the inside of the vacuum pump, the thickness of a film of a product in a flow path in the vacuum pump, or the vibration frequency of the vacuum pump;
a gas supplier for supplying a gas containing hydrogen halide, fluorine, chlorine, chlorine trifluoride, or fluorine radicals to the vacuum pump; and
a control device, wherein
the control device controls the gas supplier so that the supply of the gas to the vacuum pump is stopped depending on a rate of temperature increase calculated by the control device from the temperature measured by the sensor, the film thickness, or the vibration frequency,
the sensor comprises a temperature sensor for measuring the temperature of the inside of the vacuum pump, and
the control device calculates the rate of temperature increase from the temperature measured by the sensor, and controls the gas supplier so that the supply of the gas to the vacuum pump is stopped when the rate of temperature increase starts to decrease.