US 12,394,603 B2
Multizone gas distribution plate for trench profile optimization
Gordon Peng, San Jose, CA (US); Craig Rosslee, San Jose, CA (US); and Dan Marohl, San Jose, CA (US)
Assigned to LAM RESEARCH CORPORATION, Fremont, CA (US)
Appl. No. 17/792,157
Filed by LAM RESEARCH CORPORATION, Fremont, CA (US)
PCT Filed Jan. 8, 2021, PCT No. PCT/US2021/012604
§ 371(c)(1), (2) Date Jul. 12, 2022,
PCT Pub. No. WO2021/146099, PCT Pub. Date Jul. 22, 2021.
Claims priority of provisional application 62/960,390, filed on Jan. 13, 2020.
Prior Publication US 2023/0091524 A1, Mar. 23, 2023
Int. Cl. H01J 37/32 (2006.01); C23C 16/44 (2006.01); C23C 16/455 (2006.01); C23C 16/509 (2006.01)
CPC H01J 37/32449 (2013.01) [C23C 16/4409 (2013.01); C23C 16/45565 (2013.01); C23C 16/509 (2013.01); H01J 2237/327 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A gas distribution device for a substrate processing system, the gas distribution device comprising:
an upper plate including a first hole and a plurality of second holes, wherein the plurality of second holes are positioned radially outwardly from the first hole; and
a lower plate including
a recessed region formed in one of (i) an upper surface of the lower plate and (ii) a lower surface of the upper plate, wherein the recessed region defines a plenum volume between the upper plate and the lower plate, and
a raised fence located within the recessed region, wherein the raised fence separates the plenum volume into a first plenum and a second plenum, wherein the first plenum is in fluid communication with the first hole, and wherein the second plenum is in fluid communication with the plurality of second holes, and wherein the first plenum has a portion extending radially outwardly from the plurality of second holes.