US 12,394,601 B2
Impedance transformation in radio-frequency-assisted plasma generation
Eller Y. Juco, Tualatin, OR (US); Thomas Lee Frederick, West Linn, OR (US); Karl Frederick Leeser, West Linn, OR (US); and Paul Konkola, West Linn, OR (US)
Assigned to Lam Research Corporation, Fremont, CA (US)
Filed by Lam Research Corporation, Fremont, CA (US)
Filed on Apr. 10, 2024, as Appl. No. 18/631,368.
Application 18/631,368 is a continuation of application No. 17/756,058, granted, now 11,984,298, previously published as PCT/US2020/062924, filed on Dec. 2, 2020.
Claims priority of provisional application 62/705,293, filed on Jun. 19, 2020.
Claims priority of provisional application 62/942,458, filed on Dec. 2, 2019.
Prior Publication US 2024/0258073 A1, Aug. 1, 2024
This patent is subject to a terminal disclaimer.
Int. Cl. H01J 37/00 (2006.01); H01J 37/32 (2006.01); H03H 7/40 (2006.01)
CPC H01J 37/32183 (2013.01) [H01J 37/32082 (2013.01); H03H 7/40 (2013.01)] 12 Claims
OG exemplary drawing
 
1. An apparatus for providing signals to a device, comprising:
one or more electrically-small transmission lines to couple signals from one or more RF signal generators to a fabrication chamber; and
a reactive circuit to transform impedance of each of the one or more electrically-small transmission lines from a region having a first impedance-sensitivity to a region having a second impedance-sensitivity.