| CPC G03F 7/70891 (2013.01) [G03F 7/706 (2013.01)] | 9 Claims |
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1. An exposure apparatus that performs a first exposure operation of exposing a plurality of substrates of a first lot via a projection optical system and a second exposure operation of exposing a plurality of substrates of a second lot, to be exposed after the first lot, via the projection optical system, the apparatus comprising:
a temperature regulator configured to regulate a temperature distribution on an optical element of the projection optical system; and
a controller configured to perform, in an exposure operation period in which the second exposure operation is executed, a first process of controlling the temperature regulator so as to reduce a change of aberration of the projection optical system caused by execution of the second exposure operation,
wherein, in a case in which the controller receives an instruction for an exposure job of the second lot during the first exposure operation, and determines that a time difference between an assumed start timing of the second exposure operation and a reception timing of the instruction for the exposure job of the second lot is smaller than a predetermined threshold value, the controller performs, in a non-exposure operation period between the first exposure operation and the second exposure operation and before performing the first process, a second process for reducing the aberration of the projection optical system using a method different from the first process.
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