US 12,393,120 B2
Apparatus and method for treating a relief precursor with reduced cleaning
Bart Marc Luc Wattyn, Dentergem (BE)
Assigned to XSYS PREPRESS N.V., Ypres (BE)
Appl. No. 17/923,322
Filed by XSYS PREPRESS N.V., Ypres (BE)
PCT Filed May 5, 2021, PCT No. PCT/EP2021/061894
§ 371(c)(1), (2) Date Nov. 4, 2022,
PCT Pub. No. WO2021/224342, PCT Pub. Date Nov. 11, 2021.
Claims priority of application No. 2025512 (NL), filed on May 6, 2020.
Prior Publication US 2023/0236510 A1, Jul. 27, 2023
Int. Cl. G03F 7/30 (2006.01)
CPC G03F 7/3057 (2013.01) 21 Claims
OG exemplary drawing
 
1. An apparatus for treating a relief precursor, such as a printing plate precursor, with a liquid, comprising:
a treatment compartment with treatment means configured to treat a relief plate precursor with a liquid and to remove pieces from the relief precursor;
a liquid collection system configured to receive liquid and removed pieces from the treatment means; wherein the liquid collection system is configured to separate pieces having dimensions larger than predefined minimum dimensions from the liquid and to allow at least some of said separated pieces to be dissolved at least partially in the liquid at least when the liquid is in a static state after or before a treatment of the relief precursor with the treatment means.