US 12,393,119 B2
Optical system and lithography apparatus
Dirk Schaffer, Jena (DE); and Wolfgang Scherm, Nattheim (DE)
Assigned to Carl Zeiss SMT GmbH, Oberkochen (DE)
Filed by Carl Zeiss SMT GmbH, Oberkochen (DE)
Filed on Mar. 14, 2023, as Appl. No. 18/183,774.
Application 18/183,774 is a continuation of application No. PCT/EP2021/072693, filed on Aug. 16, 2021.
Claims priority of application No. 102020211691.1 (DE), filed on Sep. 17, 2020.
Prior Publication US 2023/0221646 A1, Jul. 13, 2023
Int. Cl. G03F 7/20 (2006.01); G01B 9/02 (2022.01); G02B 7/00 (2021.01); G02B 27/62 (2006.01)
CPC G03F 7/20 (2013.01) [G01B 9/02049 (2013.01); G02B 7/003 (2013.01); G02B 27/62 (2013.01)] 20 Claims
OG exemplary drawing
 
1. An optical system, comprising:
a movable element comprising a member selected from the group consisting of an optical element and a reference structure;
a functional element comprising a first portion, a second portion, and a constriction configured to deformationally decouple the first portion from the second portion; and
a joining agent fastening the first portion to the movable element along a fastening plane,
wherein:
the first and second portions are one integral piece;
the second portion comprises a functional surface;
the constriction is laterally outside a region of the functional surface;
the functional surface comprises a detectable measurement surface;
a position and/or orientation of the movable element is modifiable based on information from the detectable measurement surface.