US 12,392,963 B2
Structures for integrated silicon photonics optical gyroscopes
Mario Paniccia, Santa Clara, CA (US); and Avi Feshali, Los Angeles, CA (US)
Assigned to Anello Photonics, Inc, Santa Clara, CA (US)
Filed by Anello Photonics, Inc., Santa Clara, CA (US)
Filed on Apr. 24, 2023, as Appl. No. 18/306,171.
Application 18/306,171 is a continuation of application No. 17/473,699, filed on Sep. 13, 2021, granted, now 11,635,569.
Application 18/306,171 is a continuation of application No. 17/179,235, filed on Feb. 18, 2021, granted, now 11,119,276, issued on Sep. 14, 2021.
Application 18/306,171 is a continuation of application No. 16/894,120, filed on Jun. 5, 2020, granted, now 10,969,548, issued on Apr. 6, 2021.
Claims priority of provisional application 62/986,379, filed on Mar. 6, 2020.
Claims priority of provisional application 62/896,365, filed on Sep. 5, 2019.
Claims priority of provisional application 62/858,588, filed on Jun. 7, 2019.
Prior Publication US 2023/0266535 A1, Aug. 24, 2023
Int. Cl. G02B 6/136 (2006.01); G01C 19/04 (2006.01); G02B 6/12 (2006.01)
CPC G02B 6/136 (2013.01) [G01C 19/04 (2013.01); G02B 2006/12035 (2013.01); G02B 2006/12176 (2013.01); G02B 2006/12197 (2013.01)] 16 Claims
OG exemplary drawing
 
1. A waveguide structure, comprising two fused silica wafers directly adjacent to a first core, the waveguide structure created by:
providing a first fused silica wafer acting as a first cladding;
forming a patterned silicon nitride (SiN) layer on top of the first fused silica wafer, wherein the patterned SiN layer acts as the first core;
forming an oxide layer coinciding with the patterned SiN layer, wherein the oxide layer surrounds the first core from sides; and
bonding a second fused silica wafer to the oxide layer and the patterned SiN layer, wherein the second fused silica wafer acts as a second cladding, and wherein the first core is surrounded by the first fused silica wafer underneath, and second fused silica wafer directly on top and the oxide layer on the sides.