US 12,392,939 B2
Diffraction sheet and method for manufacturing the same, three-dimensional display device, light beam reproduction device, three-dimensional spatial display system, light beam reproduction method, and program
Tsubasa Suzuki, Taito-ku (JP); Susumu Takahashi, Taito-ku (JP); and Hideaki Honma, Taito-ku (JP)
Assigned to TOPPAN Inc., Taito-ku (JP)
Filed by TOPPAN Inc., Taito-ku (JP)
Filed on Feb. 20, 2023, as Appl. No. 18/171,576.
Application 18/171,576 is a continuation of application No. PCT/JP2021/030292, filed on Aug. 19, 2021.
Claims priority of application No. 2020-139079 (JP), filed on Aug. 20, 2020; and application No. 2020-163317 (JP), filed on Sep. 29, 2020.
Prior Publication US 2023/0204832 A1, Jun. 29, 2023
Int. Cl. G02B 5/18 (2006.01); G02B 5/20 (2006.01); G02B 5/32 (2006.01); G02B 30/00 (2020.01); G03B 35/08 (2021.01)
CPC G02B 5/18 (2013.01) [G02B 5/20 (2013.01); G02B 5/32 (2013.01); G02B 30/00 (2020.01); G03B 35/08 (2013.01); G02B 2207/117 (2013.01)] 11 Claims
OG exemplary drawing
 
1. A method for manufacturing a diffraction sheet, comprising:
forming a first uncured resin layer on a transparent substrate measuring 10 inches or more in diagonal;
bringing a first diffraction pattern formed on a first surface of a first plate into contact with the first uncured resin layer, the first diffraction pattern being formed in a rectangular area measuring 10 inches or more in diagonal;
placing a first mask having a plurality of first apertures formed based on a first array pattern on the first plate;
irradiating the first mask with light to cure a portion of the first uncured resin layer that overlaps the first apertures;
forming a second uncured resin layer on a surface of the transparent substrate on which the first uncured resin layer is formed;
bringing a second diffraction pattern, which is different from the first diffraction pattern, formed on a first surface of a second plate into contact with the second uncured resin layer, the second diffraction pattern being formed in a rectangular area measuring 10 inches or more in diagonal;
placing a second mask having a plurality of second apertures formed based on a second array pattern different from the first array pattern on the second plate; and
irradiating the second mask with light to cure a portion of the second uncured resin layer that overlaps the second apertures, wherein
the first uncured resin layer has a cured hardness of 0.5 MPa to 100 GPa at room temperature.