US 12,392,025 B2
Method for producing chromium sintered body, method for producing sputtering target, and method for producing substrate with chromium film
Masami Mesuda, Ayase (JP); Daiki Shono, Ayase (JP); Kenichi Itoh, Yamagata (JP); and Koichi Hanawa, Yamagata (JP)
Assigned to TOSOH CORPORATION, Yamaguchi (JP); and TOSOH SPECIALITY MATERIALS CORPORATION, Yamagata (JP)
Filed by TOSOH CORPORATION, Shunan (JP); and TOSOH SPECIALITY MATERIALS CORPORATION, Yamagata (JP)
Filed on Mar. 8, 2023, as Appl. No. 18/180,132.
Claims priority of application No. 2022-037003 (JP), filed on Mar. 10, 2022.
Prior Publication US 2023/0287560 A1, Sep. 14, 2023
Int. Cl. C23C 14/34 (2006.01); C23C 14/14 (2006.01)
CPC C23C 14/3414 (2013.01) [C23C 14/14 (2013.01)] 19 Claims
OG exemplary drawing
 
1. A method for producing a chromium sintered body, the method comprising:
a heat treatment step of heat-treating electrolytic chromium flakes at 1,200° C. or higher and 1,400° C. or lower, wherein the electrolytic chromium flakes have a purity of chromium of 99.95% or more; and
a firing step of, after the heat treatment step, filling a container with the electrolytic chromium flakes and firing a resulting filling product by hot isostatic pressing,
wherein a holding time in the firing step is three hours or more and ten hours or less.