US 12,392,024 B2
Anode for PVD processes
Wolfgang Fukarek, Dresden (DE); and Martin Holzherr, Dresden (DE)
Assigned to VTD VAKUUMTECHNIK DRESDEN GMBH, Dresden (DE)
Appl. No. 17/606,199
Filed by VTD VAKUUMTECHNIK DRESDEN GMBH, Dresden (DE)
PCT Filed Apr. 7, 2020, PCT No. PCT/DE2020/200024
§ 371(c)(1), (2) Date Oct. 25, 2021,
PCT Pub. No. WO2020/216419, PCT Pub. Date Oct. 29, 2020.
Claims priority of application No. 10 2019 110 642.7 (DE), filed on Apr. 25, 2019.
Prior Publication US 2022/0205079 A1, Jun. 30, 2022
Int. Cl. H01J 37/32 (2006.01); C23C 14/32 (2006.01)
CPC C23C 14/325 (2013.01) [H01J 37/3255 (2013.01); H01J 37/32559 (2013.01); H01J 2237/332 (2013.01)] 13 Claims
OG exemplary drawing
 
1. An anode, suitable for use in a physical vapor deposition process, wherein a surface of the anode is completely or partially covered with an adhesion-reducing thin coating that is electrically conductive, wherein the adhesion-reducing thin coating has a thickness of between 0.1 μm and 3.5 μm, wherein the thin adhesion-reducing coating is a ceramic nitride coating.