	US 12,391,559 B2
	Process for removing an impurity from a chlorosilane mixture
Jens Felix Knoth, Marktl (DE); and Uwe Pätzold, Burghausen (DE)
Assigned to Wacker Chemie AG, Munich (DE)
Appl. No. 17/910,840
Filed by WACKER CHEMIE AG, Munich (DE)
PCT Filed Nov. 5, 2020, PCT No. PCT/EP2020/081101 § 371(c)(1), (2) Date Sep. 12, 2022, PCT Pub. No. WO2022/096098, PCT Pub. Date May 12, 2022.
Prior Publication US 2023/0097766 A1, Mar. 30, 2023
Int. Cl. C01B 33/107 (2006.01); B01J 20/26 (2006.01)

CPC C01B 33/10784 (2013.01) [B01J 20/26 (2013.01)]

15 Claims

1. A process for removing an impurity from a mixture containing at least one chlorosilane and/or organochlorosilane and at least one impurity from the group comprising boron compound, phosphorus compound, and arsenic compound, said process comprising the steps of:

a) contacting the liquid mixture with an unfunctionalized organic polymer having pores with an average pore diameter of less than 50 Å, the average pore diameter being determined in accordance with DIN ISO 66134;

b) optionally removing the unfunctionalized organic polymer.