US 12,387,913 B2
Dynamic vacuum seal system for physical vapor deposition sputter applications
Joseph Buckfeller, Grove City, OH (US); Rick Eller, Grove City, OH (US); John Rizer, Grove City, OH (US); Lora Thrun, Grove City, OH (US); and Gary Offord, Grove City, OH (US)
Assigned to TOSOH SMD, INC., Grove City, OH (US)
Filed by TOSOH SMD, INC., Grove City, OH (US)
Filed on Jan. 8, 2025, as Appl. No. 19/014,165.
Application 19/014,165 is a continuation of application No. 18/992,549, previously published as PCT/US2023/027301, filed on Jul. 10, 2023.
Claims priority of provisional application 63/367,914, filed on Jul. 8, 2022.
Prior Publication US 2025/0149303 A1, May 8, 2025
Int. Cl. H01J 37/32 (2006.01); C23C 14/34 (2006.01); C23C 14/56 (2006.01); H01J 37/34 (2006.01)
CPC H01J 37/32513 (2013.01) [C23C 14/3407 (2013.01); C23C 14/564 (2013.01); H01J 37/3411 (2013.01); H01J 37/3435 (2013.01); H01J 37/3441 (2013.01)] 28 Claims
OG exemplary drawing
 
1. A sealing kit for a physical vapor deposition (PVD) vacuum chamber, comprising:
a sealing ring for the PVD vacuum chamber comprising:
a compressible portion, wherein the compressible portion comprises at least one protrusion and at least one recess;
a rigid portion adjacent the compressible portion, wherein the rigid portion has a rib that is substantially encapsulated by a secondary material;
a rim that extends from a first surface of the sealing ring and is configured to selectively couple to an isolation ring;
a removable shield that is configured to selectively couple to a first end of the compressible portion and that is configured to isolate the compressible portion from an interior of the vacuum chamber;
the isolation ring, comprising:
a first surface configured to selectively interface with the compressible portion and the rigid portion of the sealing ring when installed in the PVD vacuum chamber, wherein the first surface is generally flat;
a step-out portion configured to selectively interface with the rim of the sealing ring when installed in the PVD vacuum chamber; and
a sputtering target, comprising:
a peripheral flange surface of a first surface configured to interface with the sealing ring, when installed in the PVD vacuum chamber, wherein the peripheral flange surface is devoid of any O-ring grooves, vent slots, and scallops and is configured to contact the sealing ring with a flat surface.