US 12,384,805 B2
Iodine-containing metal compound and composition for depositing thin film including the same
Yong Hee Kwone, Daejeon (KR); Young Jae Im, Daejeon (KR); Sang Yong Jeon, Daejeon (KR); Tae Seok Byun, Daejeon (KR); Sang Chan Lee, Daejeon (KR); and Sang Ick Lee, Daejeon (KR)
Assigned to DNF CO., LTD., Daejeon (KR)
Filed by DNF CO., LTD., Daejeon (KR)
Filed on Feb. 7, 2023, as Appl. No. 18/165,870.
Claims priority of application No. 10-2022-0016153 (KR), filed on Feb. 8, 2022; and application No. 10-2023-0009308 (KR), filed on Jan. 25, 2023.
Prior Publication US 2023/0250114 A1, Aug. 10, 2023
Int. Cl. C07F 7/22 (2006.01); C01G 19/02 (2006.01); C01G 30/00 (2006.01); C07F 9/90 (2006.01); C23C 16/40 (2006.01); C23C 16/455 (2006.01)
CPC C07F 7/2284 (2013.01) [C01G 19/02 (2013.01); C01G 30/005 (2013.01); C07F 9/902 (2013.01); C23C 16/40 (2013.01); C23C 16/407 (2013.01); C23C 16/45536 (2013.01); C23C 16/45553 (2013.01)] 16 Claims
 
1. An iodine-containing metal compound represented by the following Chemical Formula 2:

OG Complex Work Unit Chemistry
wherein
M1 is a Sn or Pb;
R11 is hydrogen or C1-7 alkyl;
R12 is C1-7 alkyl;
R13 is C1-7 alkyl, C2-7 alkenyl, or —NR15R16;
R14 is —NR15R16; and
in which R15 and R16 are independently of each other hydrogen or C1-7 alkyl.