US 12,384,003 B2
Methods of modeling and controlling pad wear
Sivakumar Dhandapani, San Jose, CA (US)
Assigned to Applied Materials, Inc., Santa Clara, CA (US)
Filed by Applied Materials, Inc., Santa Clara, CA (US)
Filed on May 18, 2022, as Appl. No. 17/663,952.
Claims priority of provisional application 63/195,450, filed on Jun. 1, 2021.
Prior Publication US 2022/0379431 A1, Dec. 1, 2022
Int. Cl. B24B 49/18 (2006.01); B24B 37/005 (2012.01); B24B 37/04 (2012.01); B24B 49/00 (2012.01); B24B 49/16 (2006.01); B24B 53/017 (2012.01); G05B 23/02 (2006.01)
CPC B24B 49/186 (2013.01) [B24B 37/005 (2013.01); B24B 37/042 (2013.01); B24B 49/003 (2013.01); B24B 49/16 (2013.01); B24B 53/017 (2013.01); G05B 23/0254 (2013.01)] 22 Claims
OG exemplary drawing
 
1. A method of polishing a substrate, comprising:
receiving, by a controller, a plurality of dwell times of a pad conditioning disk, wherein the plurality of dwell times are to be used in a pad conditioning process performed on a pad disposed on a platen, each dwell time corresponding to a zone of a plurality of zones of the pad disposed on the platen;
determining, by the controller, a plurality of total pad conditioning disk cut times to be used in the pad conditioning process based on the plurality of dwell times of the pad conditioning disk, each total pad conditioning disk cut time corresponding to a zone of the plurality of zones;
generating, by the controller, a pad wear removal model based on a set of parameters, including the plurality of dwell times and the plurality of total pad conditioning disk cut times;
applying, by the controller, a first filter to the pad wear removal model to form a first filtered pad wear removal model, wherein the first filter is configured to filter the pad wear removal model based on receipt of a first set of parameter data;
simultaneously applying, by the controller, a second filter to the pad wear removal model to form a second filtered pad wear removal model, wherein the second filter is configured to filter the pad wear removal model based on receipt of a second set of parameter data and simultaneously applying the second filter is performed in parallel with applying the first filter to the pad wear removal model;
updating, by the controller, the pad wear removal model based on the first filtered pad wear removal model and the second filtered pad wear removal model to form an updated pad wear removal model;
applying, by the controller, the updated pad wear removal model to a pad conditioning recipe to form an updated pad conditioning recipe for conditioning the pad; and
conditioning the pad using the updated pad conditioning recipe.