| CPC H10B 43/27 (2023.02) [H10B 41/10 (2023.02); H10B 41/27 (2023.02); H10B 41/35 (2023.02); H10B 43/10 (2023.02); H10B 43/35 (2023.02)] | 18 Claims |

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1. A microelectronic device, comprising:
a stack structure comprising tiers arranged in a vertically repeated pattern, the tiers individually comprising at least one conductive structure and at least one insulative structure;
contact structures extending through the stack structure, the contact structures comprising at least one conductive material; and
at least one insulative material laterally adjacent the contact structures,
the at least one insulative material defining, in lower elevations of the stack structure, insulative extensions protruding horizontally outwardly, and
in the lower elevations of the stack structure, the at least one conductive structures of the stack structure defining lesser horizontal dimensions than a horizontal dimension defined by the at least one conductive structures immediately above the lower elevations of the stack structure.
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