US 12,382,610 B2
Vapor chamber and electronic device
Shinichiro Takahashi, Tokyo-to (JP); Takayuki Ota, Tokyo-to (JP); Kazunori Oda, Tokyo-to (JP); Toshihiko Takeda, Tokyo-to (JP); Kiyotaka Takematsu, Tokyo-to (JP); Terutoshi Momose, Tokyo-to (JP); and Yoko Nakamura, Tokyo-to (JP)
Assigned to DAI NIPPON PRINTING CO., LTD., Tokyo (JP)
Filed by DAI NIPPON PRINTING CO., LTD., Tokyo (JP)
Filed on Dec. 28, 2023, as Appl. No. 18/398,691.
Application 18/398,691 is a division of application No. 17/059,301, granted, now 11,903,167, previously published as PCT/JP2019/021609, filed on May 30, 2019.
Claims priority of application No. 2018-103620 (JP), filed on May 30, 2018; and application No. 2018-103633 (JP), filed on May 30, 2018.
Prior Publication US 2024/0130083 A1, Apr. 18, 2024
Int. Cl. F28D 15/00 (2006.01); F28D 15/02 (2006.01); H05K 7/20 (2006.01)
CPC H05K 7/20318 (2013.01) [F28D 15/0233 (2013.01); F28D 15/0266 (2013.01)] 5 Claims
OG exemplary drawing
 
1. A vapor chamber in which an enclosed space is formed, and a working fluid is sealed in the enclosed space, the enclosed space comprising:
a plurality of condensate flow paths through which a fluid that is the working fluid in a condensing state flows; and
vapor flow paths through which a vapor that is the working fluid in a vaporizing state flows,
wherein each of the vapor flow paths is provided with projecting parts sticking out on a vapor flow path side in an aligning direction of the condensate flow paths and the vapor flow paths, each of the projecting parts having a projecting amount varying in an extending direction of the vapor flow paths, and
when the vapor chamber is divided into a plurality of areas in the extending direction of the vapor flow paths, each projecting part in one of the areas has a projecting amount smaller than each projecting part in both areas which are adjacent to the one area.