| CPC H01L 21/6833 (2013.01) [H01J 37/32724 (2013.01); H01L 21/67109 (2013.01)] | 29 Claims |

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1. A baseplate for a substrate support in a substrate processing system, the baseplate comprising:
at least one coolant channel formed within the baseplate, wherein (i) the at least one coolant channel defines a volume within the baseplate configured to retain a coolant and (ii) the at least one coolant channel follows a path configured to distribute the coolant in the volume throughout the baseplate, and wherein the at least one coolant channel comprises a plurality of turns distributed radially across the baseplate, the plurality of turns comprising a first set of turns located in a radially outer zone of the baseplate and a second set of turns located in a radially inner zone of the baseplate; and
at least one fin provided within the at least one coolant channel, wherein the at least one fin extends from at least one of a top, a bottom, and a sidewall of the at least one coolant channel into the volume to increase a surface area of the at least one coolant channel;
wherein the at least one fin comprises a plurality of fins; and
wherein the first set of turns comprises a first set of fins of the plurality of fins having a fixed height, the second set of turns comprises a second set of fins of the plurality of fins, and a height of the second set of fins decreases from an outermost turn to an innermost turn of the second set of turns.
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