CPC G03F 7/70916 (2013.01) [G03F 7/70033 (2013.01); G03F 7/70166 (2013.01); G03F 7/70175 (2013.01); G03F 7/70883 (2013.01); G03F 7/70891 (2013.01); G03F 7/70908 (2013.01); H05G 2/0025 (2024.08)] | 20 Claims |
1. An extreme ultraviolet (EUV) lithography system, comprising:
a vane bucket module, comprising:
a temperature adjusting pack having a plurality of inlets; and
a collecting tank inserted into the temperature adjusting pack, wherein the collecting tank has a cover, the cover comprises a plurality of through holes, the inlets of the temperature adjusting pack are aligned with the through holes of the cover, each through hole has a minimum depth at a first position and a maximum depth at a second position, and the first position is closer to a center of the cover than the second position.
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