US 12,379,670 B2
Substrate, patterning device and metrology apparatuses
Mattia Marelli, Eindhoven (NL); and Mohammadreza Hajiahmadi, Den Bosch (NL)
Assigned to ASML Netherlands B.V., Veldhoven (NL)
Appl. No. 18/000,148
Filed by ASML Netherlands B.V., Veldhoven (NL)
PCT Filed May 10, 2021, PCT No. PCT/EP2021/062263
§ 371(c)(1), (2) Date Nov. 29, 2022,
PCT Pub. No. WO2021/239448, PCT Pub. Date Dec. 2, 2021.
Claims priority of application No. 20177328 (EP), filed on May 29, 2020.
Prior Publication US 2023/0205097 A1, Jun. 29, 2023
Int. Cl. G03F 7/00 (2006.01); G03F 9/00 (2006.01)
CPC G03F 7/70641 (2013.01) [G03F 9/7026 (2013.01); G03F 9/7076 (2013.01)] 14 Claims
OG exemplary drawing
 
1. A method for determining a focus parameter value used to expose a structure on a substrate, the method comprising:
obtaining measurement data relating to a measurement of the structure, wherein the structure comprises a single periodic structure per measurement location;
decomposing the measurement data into component data comprising first and second harmonic components of the measurement data;
processing the first and second harmonic components by determining a combination of amplitudes or phases of each of the first and second harmonic components to extract processed component data having a reduced dependence on non-focus related effects; and
determining the focus parameter value from the processed component data.