| CPC G03F 1/84 (2013.01) [G01N 21/4795 (2013.01); G01N 21/8806 (2013.01); G01N 21/8851 (2013.01); G01N 21/94 (2013.01); G03F 7/2004 (2013.01); G01N 2021/8896 (2013.01)] | 17 Claims |

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1. An inspection system comprising:
an illuminator that generates a first illumination beam at a first wavelength and a second illumination beam at a second wavelength, the first wavelength being different from the second wavelength, and irradiates an object simultaneously with the first illumination beam and the second illumination beam;
a detector that receives radiation scattered by a particle present at a surface of the object at the first wavelength and generates a detection signal; and
processing circuitry configured to:
acquire a first image based on a first intensity of the detection signal at the first wavelength;
acquire a second image based on a second intensity of a second detection signal acquired at the second wavelength;
determine a third image by comparing the first intensity and the second intensity;
analyze a photothermal modulation of Mie scattering of the detection signal at the first wavelength; and
determine a material type of the particle based on the analyzing;
wherein the first wavelength is in the visible spectrum and the second wavelength is in the infrared spectrum.
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