US 12,379,543 B2
Photonic integrated circuit system and method of fabrication
Lei Wang, Santa Clara, CA (US); Thomas W. Baehr-Jones, Santa Clara, CA (US); and Mitchell A. Nahmias, Santa Clara, CA (US)
Assigned to Luminous Computing, Inc., Santa Clara, CA (US)
Filed by Luminous Computing, Inc., Santa Clara, CA (US)
Filed on Apr. 30, 2024, as Appl. No. 18/651,273.
Application 18/651,273 is a continuation of application No. 18/176,861, filed on Mar. 1, 2023, granted, now 12,007,603.
Application 18/176,861 is a continuation of application No. 17/671,049, filed on Feb. 14, 2022, granted, now 11,609,375, issued on Mar. 21, 2023.
Claims priority of provisional application 63/281,567, filed on Nov. 19, 2021.
Claims priority of provisional application 63/152,275, filed on Feb. 22, 2021.
Prior Publication US 2024/0280748 A1, Aug. 22, 2024
Int. Cl. G02B 6/12 (2006.01); G02B 6/132 (2006.01); G02B 6/136 (2006.01); G02B 6/38 (2006.01)
CPC G02B 6/12019 (2013.01) [G02B 6/132 (2013.01); G02B 6/136 (2013.01); G02B 2006/12061 (2013.01)] 18 Claims
OG exemplary drawing
 
1. A method of fabricating a photonic integrated circuit (PIC) on a substrate, comprising:
lithographically defining a transition between a first photonic circuit block and a first connecting waveguide having a first width using a first lithographic patterning technique, the photonic integrated circuit comprising:
a transition waveguide having a second width, configured for optically coupling to a photonic element in the first photonic circuit block; and
a transition feature extending between the transition waveguide and the first connecting waveguide, tapering from the first width to the second width;
wherein defining the transition feature and the transition waveguide comprises providing a tapered masked feature over the first connecting waveguide and the first photonic circuit block configured to define the transition feature and the transition waveguide; and
wherein the tapered masked feature has a maximum width greater than the first width, and extends past the first width in both directions.