US 12,378,432 B2
Film and substrate having surface covered with same
Masamichi Morita, Osaka (JP); Hiroki Yamaguchi, Osaka (JP); Atsushi Sakakura, Osaka (JP); and Kazuki Hosoda, Osaka (JP)
Assigned to DAIKIN INDUSTRIES, LTD., Osaka (JP)
Filed by DAIKIN INDUSTRIES, LTD., Osaka (JP)
Filed on May 3, 2022, as Appl. No. 17/735,565.
Application 17/735,565 is a continuation of application No. PCT/JP2020/041121, filed on Nov. 2, 2020.
Claims priority of application No. 2019-201076 (JP), filed on Nov. 5, 2019; and application No. 2020-168146 (JP), filed on Oct. 5, 2020.
Prior Publication US 2022/0259454 A1, Aug. 18, 2022
Int. Cl. C09D 137/00 (2006.01); C08F 24/00 (2006.01)
CPC C09D 137/00 (2013.01) [C08F 24/00 (2013.01)] 9 Claims
 
1. A base material having a surface directly coated with an insulating film for an electrowetting element, the insulating film comprising a fluoropolymer,
the fluoropolymer containing a monomer unit represented by the following formula (1-11):

OG Complex Work Unit Chemistry
in an amount of 100 mol %, based on the total monomer units,
the insulating film for an electrowetting element being a monolayer film, and
the insulating film for an electrowetting element having the following properties:
a sliding velocity of 150 mm/s or more at an inclination angle of 30° and
an average surface roughness (Ra) of 1 μm or less.