US 12,376,504 B2
Embedded backside PCRAM device structure
Chung-Liang Cheng, Hsinchu (TW)
Assigned to Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu (TW)
Filed by Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu (TW)
Filed on Aug. 30, 2021, as Appl. No. 17/461,548.
Prior Publication US 2023/0068754 A1, Mar. 2, 2023
Int. Cl. H10N 70/20 (2023.01); G11C 13/00 (2006.01); H10B 63/00 (2023.01); H10N 70/00 (2023.01)
CPC H10N 70/253 (2023.02) [G11C 13/0004 (2013.01); H10B 63/30 (2023.02); H10N 70/021 (2023.02); H10N 70/231 (2023.02)] 20 Claims
OG exemplary drawing
 
1. An integrated circuit, comprising:
a first chip including a memory cell, the memory cell including:
a transistor including:
a plurality of semiconductor nanosheets;
a gate dielectric surrounding the semiconductor nanosheets;
a gate electrode including a gate metal surrounding the semiconductor nanosheets and separated from the semiconductor nanosheets by the gate dielectric;
a first semiconductor source/drain terminal coupled to the semiconductor nanosheets; and
a second semiconductor source/drain terminal coupled to the semiconductor nanosheets;
a phase change memory element electrically coupled to the transistor; and
a first electrode coupled between the phase change memory element and the transistor and having a top surface coupled to a bottom surface of the first semiconductor source/drain terminal; and
a second chip bonded to the first chip, wherein the transistor is positioned between the phase change memory element and the second chip.