| CPC H01L 21/67023 (2013.01) [B23Q 11/0042 (2013.01); B23Q 11/08 (2013.01); B24B 7/228 (2013.01); B24B 55/06 (2013.01); H01L 21/67092 (2013.01); H01L 21/67253 (2013.01); H01L 21/687 (2013.01)] | 20 Claims |

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1. A processing apparatus, comprising:
a chuck configured to hold a substrate;
a moving unit to which a processing tool configured to process the substrate is mounted, wherein the moving unit comprises a flange to which the processing tool is mounted and a spindle shaft on which the flange is provided;
a sprinkler configured to spray a cleaning liquid configured to clean the moving unit from an outside of the moving unit; and
a housing accommodating the chuck, the processing tool, and the sprinkler therein,
wherein the sprinkler comprises a fixed unit fixed to an inside of the housing, and a rotating unit rotatably supported at the fixed unit,
wherein the rotating unit comprises a nozzle configured to discharge the cleaning liquid toward the moving unit to clean the moving unit, and a rotation block configured to hold the nozzle,
wherein the rotating unit rotates while spraying the cleaning liquid from the nozzle toward the moving unit and the housing to clean the moving unit and the housing,
wherein the moving unit comprises a spindle cover that surrounds the spindle shaft, and
wherein the nozzle is configured to discharge the cleaning liquid toward the spindle cover.
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