US 12,366,808 B2
Substrate holder, lithographic apparatus, device manufacturing method, and method of manufacturing a substrate holder
Raymond Wilhelmus Louis Lafarre, Helmond (NL); Sjoerd Nicolaas Lambertus Donders, Vught (NL); Nicolaas Ten Kate, Almkerk (NL); Nina Vladimirovna Dziomkina, Eindhoven (NL); Yogesh Pramod Karade, Eindhoven (NL); and Elisabeth Corinne Rodenburg, Heeze (NL)
Assigned to ASML NETHERLANDS B.V., Veldhoven (NL)
Filed by ASML NETHERLANDS B.V., Veldhoven (NL)
Filed on Apr. 15, 2024, as Appl. No. 18/635,589.
Application 18/635,589 is a continuation of application No. 18/299,534, filed on Apr. 12, 2023, granted, now 11,960,213.
Application 18/299,534 is a continuation of application No. 17/587,236, filed on Jan. 28, 2022, granted, now 11,628,498.
Application 17/587,236 is a continuation of application No. 17/138,480, filed on Dec. 30, 2020, granted, now 11,235,388.
Application 17/138,480 is a continuation of application No. 16/369,368, filed on Mar. 29, 2019, granted, now 10,898,955.
Application 16/369,368 is a continuation of application No. 15/261,553, filed on Sep. 9, 2016, granted, now 10,245,641.
Application 15/261,553 is a continuation of application No. 14/374,197, granted, now 9,442,395, previously published as PCT/EP2013/050818, filed on Jan. 17, 2013.
Claims priority of provisional application 61/621,660, filed on Apr. 9, 2012.
Claims priority of provisional application 61/621,648, filed on Apr. 9, 2012.
Claims priority of provisional application 61/594,857, filed on Feb. 3, 2012.
Prior Publication US 2024/0264533 A1, Aug. 8, 2024
This patent is subject to a terminal disclaimer.
Int. Cl. G03F 7/00 (2006.01); B05D 3/06 (2006.01); B05D 5/00 (2006.01); B22F 7/06 (2006.01); B22F 10/00 (2021.01); B22F 10/20 (2021.01); B23K 26/342 (2014.01); B23K 26/354 (2014.01); B23Q 3/18 (2006.01); B33Y 10/00 (2015.01); B33Y 80/00 (2015.01); G03F 7/20 (2006.01); B22F 10/25 (2021.01); B22F 10/28 (2021.01); B22F 10/66 (2021.01)
CPC G03F 7/70341 (2013.01) [B05D 3/06 (2013.01); B05D 5/00 (2013.01); B22F 7/062 (2013.01); B22F 10/00 (2021.01); B22F 10/20 (2021.01); B23K 26/342 (2015.10); B23K 26/354 (2015.10); B23Q 3/18 (2013.01); B33Y 10/00 (2014.12); B33Y 80/00 (2014.12); G03F 7/20 (2013.01); G03F 7/70416 (2013.01); G03F 7/707 (2013.01); G03F 7/70708 (2013.01); G03F 7/70716 (2013.01); G03F 7/70733 (2013.01); G03F 7/708 (2013.01); B22F 10/25 (2021.01); B22F 10/28 (2021.01); B22F 10/66 (2021.01)] 20 Claims
OG exemplary drawing
 
1. A substrate holder for use in a lithographic apparatus, the substrate holder comprising:
a main body having a first side of the main body and a second side of the main body opposite to the first side;
a plurality of first burls at the first side of the main body and having end surfaces to support a substrate; and
a plurality of second burls at the second side of the main body,
wherein each of the first burls and/or second burls has a cross-sectional width in a range of about 250 μm to about 500 μm, and
wherein the main body is grounded.