US 12,366,799 B2
Apparatus for correcting photomask and method thereof
Hyo Won Yang, Seoul (KR); Hyun Yoon, Gyeonggi-do (KR); Ji Hoon Jeong, Gyeonggi-do (KR); In Ki Jung, Gyeonggi-do (KR); Ki Hoon Choi, Chungcheongnam-do (KR); Tae Hee Kim, Gyeonggi-do (KR); and Se Hoon Oh, Chungcheongnam-do (KR)
Assigned to SEMES CO., LTD., Chungcheongnam-do (KR)
Filed by SEMES CO., LTD., Chungcheongnam-do (KR)
Filed on Aug. 31, 2022, as Appl. No. 17/899,616.
Claims priority of application No. 10-2021-0191908 (KR), filed on Dec. 30, 2021.
Prior Publication US 2023/0229074 A1, Jul. 20, 2023
Int. Cl. G03F 1/72 (2012.01); G03F 7/00 (2006.01)
CPC G03F 1/72 (2013.01) [G03F 7/70025 (2013.01); G03F 7/70558 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A method for correcting a photomask comprising:
measuring an intensity profile of a laser,
acquiring etching amount data corresponding to the measured intensity profile using a library,
determining a process parameter of the laser based on the etching amount data, and
correcting a photomask with the laser according to the determined process parameter.