| CPC A61K 8/41 (2013.01) [A61K 8/0208 (2013.01); A61K 8/042 (2013.01); A61K 8/046 (2013.01); A61K 8/19 (2013.01); A61K 8/42 (2013.01); A61K 8/46 (2013.01); A61K 8/73 (2013.01); A61K 8/8152 (2013.01); A61Q 9/04 (2013.01); A61K 2800/262 (2013.01)] | 24 Claims |
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1. A depilatory composition comprising:
a depilatory active, wherein the depilatory active is present in an amount of from 0.5 to 10 wt % based on the weight of the depilatory composition, and wherein the depilatory active contains a thiol group and is selected from the group consisting f potassium thioglycolate, calcium thioglycolate, thioglycolic acid, dithioerythritol, thioglycerol, thioglycol, thioxanthine, thiosalicylic acid, N-acetyl-L-cysteine, lipoic acid, sodium dihydrolipoate 6,8-dithiooctanoate, sodium 6,8-diothiooctanoate, a hydrogen sulphide salt, 2-mercaptopropionic acid, 3-mercaptopropionic acid, thiomalic acid, ammonium thioglycolate, glyceryl monothioglycolate, monoethanolamine thioglycolate, monoethanolamine thioglycolic acid, diammoniumdithiodiglycolate, ammonium thiolactate, monoethanolamine thiolactate, thioglycolamide, homocysteine, cysteine, glutathione, dithiothreitol, dihydrolipoic acid, 1,3-dithiopropanol, thioglycolamide, thioglycol-hydrazine, keratinase, guanidine thioglycolate, cysteamine, and combinations thereof;
an alkali metal hydroxide selected from the group consisting of sodium hydroxide and/or potassium hydroxide; and
an aminoalkylpropanol, wherein the aminoalkylpropanol is present in an amount of from 0.2 to 10 wt % based on the weight of the depilatory composition; and
wherein at 20° C. the composition has a pH in the range of from 10 to 12.5.
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